Dr. Shumay Shang
Product Manager at Mentor a Siemens Business
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 28 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Data modeling, Calibration, Inspection, Finite element methods, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Failure analysis, Optics manufacturing

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Manufacturing, Bridges, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Monochromatic aberrations, Optical lithography, Metals, Manufacturing, Photomasks, Double patterning technology, Computational lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Etching, Metals, Error analysis, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology, Model-based design

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Visualization, Etching, Metals, Manufacturing, Bridges, Photomasks, Double patterning technology, Optical proximity correction

Showing 5 of 20 publications
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