Dr. Shun-Der Wu
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Etching, Scanners, Error analysis, Photomasks, Double patterning technology, Source mask optimization

SPIE Journal Paper | January 1, 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

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