Shun-ichi Kodama
Research at AGC Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Polymers, Silicon, Resistance, Photomasks, Fluorine, Semiconducting wafers, Polymer thin films, Absorption

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Gases, Resistance, Fluorine, Semiconducting wafers, Absorption

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Transparency, Polymers, Glasses, Photoresist materials, Polymerization, Photomasks, Manganese, Fluorine, Phase shifts

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