Hafnium oxide, hafnium crystal bar and high-purity hafnium were prepared using extraction separation, reduction, electrolytic refining, iodide refining and electron beam melting process by General Research Institute for Nonferrous Metals. A hundreds-kilogram production line has been built. The purity of the high-purity hafnium was Zr/(Zr+Hf) <0.3wt% and Zr+Hf>99.99wt%, which enables a high laser induced damage threshold.
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