Mr. Shunsuke Koshihara
Senior Engineer at Hitachi High-Tech Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (20)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Atomic force microscopy, Scanning electron microscopy, Time metrology, Finite element methods, Line width roughness, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Annealing, Directed self assembly, High volume manufacturing, Nanolithography, Thin film manufacturing, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Metrology, Logic, Statistical analysis, Etching, Germanium, Resistance, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Algorithm development, Overlay metrology, Standards development, Back end of line, Fin field effect transitor

SPIE Journal Paper | October 12, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

SPIE Journal Paper | July 19, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Etching, Image processing, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Process control, Line width roughness, Critical dimension metrology, Line edge roughness

Showing 5 of 20 publications
Conference Committee Involvement (7)
Metrology, Inspection, and Process Control for Microlithography XXXIII
24 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 7 published special sections
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