Shunsuke Ochiai
at Yamaguchi Univ
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Polymethylmethacrylate, Argon, Chemical species, Dry etching, Resistance, Scanning electron microscopy, Photomasks, Chlorine, Photoresist processing

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electron beams, Polymethylmethacrylate, Polymers, Resistance, Scanning electron microscopy, Photomasks, Photoresist processing, Halogens, Photomask technology

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Electron beams, Dry etching, Polymers, Scanning electron microscopy, Photomasks, Line width roughness, Nanoimprint lithography, Line edge roughness, Photoresist processing

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