Mr. Shunsuke Sato
at Toppan Printing
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Metrology, Data modeling, Metals, Image registration, Data processing, Photomasks, Semiconducting wafers, Overlay metrology, Model-based design

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Radium

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Opacity, Quartz, Glasses, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Binary data

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