Dr. Shuo-Yen Chou
Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Monte Carlo methods, Photomasks, Beam shaping, Critical dimension metrology, Model-based design, Process modeling, Vestigial sideband modulation

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Polarization, Polarizers, Image quality, Transmittance, Photomasks, Immersion lithography, Dielectric polarization, Diffraction gratings

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Spectrum analysis, Polarization, Reflectivity, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Image processing, Laser energy, Scanning electron microscopy, Photomasks, Optical simulations, Optical proximity correction, Convolution, Semiconducting wafers

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