Mr. Shusuke Yoshitake
Group Manager at NuFlare Technology Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (34)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Signal to noise ratio, Diffraction, Reticles, Defect detection, Sensors, Inspection, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Defect inspection

SPIE Journal Paper | July 27, 2017
JM3 Vol. 16 Issue 04

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Defect detection, Scattering, Sensors, Scanners, Photons, Inspection, Image restoration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Diffraction, Coherence imaging, Mirrors, Metrology, Defect detection, Sensors, Microscopy, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, High volume manufacturing, Spherical lenses

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Microscopes, Diffraction, Reticles, Defect detection, Imaging systems, Scattering, Sensors, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Signal to noise ratio, Diffraction, Metrology, Scattering, Sensors, Microscopy, Light scattering, Inspection, Photomasks, Extreme ultraviolet

Showing 5 of 34 publications
Conference Committee Involvement (2)
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
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