Shusuke Yoshitake
Group Manager at NuFlare Technology Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (37)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 18 March 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Photomasks, Nickel, Extreme ultraviolet, Inspection, Signal to noise ratio, Line edge roughness, Extreme ultraviolet lithography, Reflectivity, Image acquisition, Diffraction

Proceedings Article | 20 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Signal to noise ratio, Mirrors, Optical properties, Nickel, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase measurement, Absorption

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Signal to noise ratio, Diffraction, Reticles, Defect detection, Sensors, Inspection, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Defect inspection

SPIE Journal Paper | 27 July 2017
JM3 Vol. 16 Issue 04

Showing 5 of 37 publications
Conference Committee Involvement (4)
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top