CONFERENCE PROCEEDINGS
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Shuuichi Nishikido
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (2)
PROCEEDINGS ARTICLE | March 31, 2010
Productivity improvement in the wafer bevel and backside cleaning before exposure
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Contamination, Image processing, Particles, Coating, Immersion lithography, Head-mounted displays, Thin film coatings, Photoresist processing, Semiconducting wafers
PROCEEDINGS ARTICLE | April 1, 2009
Productivity improvement in the wafer backside cleaning before exposure
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Optical lithography, Contamination, Defect detection, Sensors, Particles, Coating, Manufacturing, Inspection, Semiconducting wafers, Current controlled current source
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