Shuxin Li
Chief Engineer at Shanghai Micro Electronics Equipment Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconducting wafers, Binary data, Photomasks, Scanners, Overlay metrology, Lithography, Phase shifts, Reticles, Critical dimension metrology, Process control

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Optical alignment, Source mask optimization, Data modeling, Control systems, Software development, Time metrology, Process control

PROCEEDINGS ARTICLE | August 21, 2009
Proc. SPIE. 7404, Nanostructured Thin Films II
KEYWORDS: Zinc oxide, Crystals, Oxygen, Glasses, Sputter deposition, Optical properties, Thin films, Atomic force microscopy, Transmittance, Argon

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