Shuxin Yao
at Shanghai Integrated Circuit Research & Development Ctr. Co., Ltd.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Etching, Metrology, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Critical dimension metrology, Performance modeling, Image processing, Semiconducting wafers

Proceedings Article | 17 May 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Calibration, Data modeling, Scanning electron microscopy, Optical proximity correction, Performance modeling, Critical dimension metrology, Semiconducting wafers, Image processing, Photomasks

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top