Shyi-Long Shy
Retired at National Nano Device Labs
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Electron beam lithography, Electron beams, Etching, Metals, Dielectrics, Ions, Inspection, Photomasks

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymethylmethacrylate, Polymers, Glasses, Coating, Printing, Picosecond phenomena, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymers, Silicon, Coating, Resistance, Printing, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Microelectromechanical systems, Lithography, Light sources, Light emitting diodes, Mercury, Lamps, Printing, Photoresist materials, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Semiconductors, Lithography, Nanostructures, Image processing, Scanning electron microscopy, Optoelectronic devices, Aluminum, Photomicroscopy, Field emission displays, Nanolithography

Showing 5 of 20 publications
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