Mr. Shyi-Long Shy Profile

Shyi-Long Shy

Retired at National Nano Device Labs

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Publications (20)

PROCEEDINGS ARTICLE | March 19, 2018

Contact/proximity stepper using UVA, UVB, and UVC light sources

Proc. SPIE. 10584, Novel Patterning Technologies 2018

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PROCEEDINGS ARTICLE | March 21, 2017

Inspection and fabrication of nano-imprint stamp using electron and ion dual beam system

Proc. SPIE. 10144, Emerging Patterning Technologies

KEYWORDS: Electron beam lithography, Electron beams, Etching, Metals, Dielectrics, Ions, Inspection, Photomasks

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PROCEEDINGS ARTICLE | April 1, 2016

Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers

Proc. SPIE. 9777, Alternative Lithographic Technologies VIII

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymethylmethacrylate, Polymers, Glasses, Coating, Printing, Picosecond phenomena, Nanoimprint lithography

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PROCEEDINGS ARTICLE | March 19, 2015

Negative e-beam resists using for nano-imprint lithography and silicone mold fabrication

Proc. SPIE. 9423, Alternative Lithographic Technologies VII

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymers, Silicon, Coating, Resistance, Printing, Nanoimprint lithography, Photoresist processing

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PROCEEDINGS ARTICLE | March 31, 2014

Novel wafer stepper with violet LED light source

Proc. SPIE. 9052, Optical Microlithography XXVII

KEYWORDS: Microelectromechanical systems, Lithography, Light sources, Light emitting diodes, Mercury, Lamps, Printing, Photoresist materials, Photomasks, Semiconducting wafers

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PROCEEDINGS ARTICLE | March 21, 2012

Fabrication nanopillars pattern on PDMS using anodic aluminum oxide film as template

Proc. SPIE. 8323, Alternative Lithographic Technologies IV

KEYWORDS: Semiconductors, Lithography, Nanostructures, Image processing, Scanning electron microscopy, Optoelectronic devices, Aluminum, Photomicroscopy, Field emission displays, Nanolithography

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PROCEEDINGS ARTICLE | March 19, 2012

Gray-level 3D resist process and its application

Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX

KEYWORDS: Electron beam lithography, Prisms, Electron beams, Solar concentrators, Coating, LCDs, Optical alignment, Fresnel lenses, Photoresist processing, Semiconducting wafers

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PROCEEDINGS ARTICLE | March 1, 2011

Synthesis of well-aligned and highly density nanopore arrays with the assistance of ultrasonic

Proc. SPIE. 7947, Quantum Dots and Nanostructures: Synthesis, Characterization, and Modeling VIII

KEYWORDS: Oxides, Nanostructures, Metals, Image processing, Interfaces, Atomic force microscopy, Ultrasonics, Scanning electron microscopy, Aluminum, Nanolithography

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PROCEEDINGS ARTICLE | December 14, 2009

Green binary and phase shifting mask

Proc. SPIE. 7520, Lithography Asia 2009

KEYWORDS: Thin films, Lithography, Electron beam lithography, Phase shifting, Nickel, Silicon, Chromium, Image analysis, Photomasks, Binary data

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PROCEEDINGS ARTICLE | May 20, 2006

Fabrication of nanoimprint stamp and its application

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Semiconductors, Nanotechnology, Electron beam lithography, Electron beams, Microfluidics, Data storage, Polymers, Biotechnology, Nanoimprint lithography, Nanolithography

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PROCEEDINGS ARTICLE | May 20, 2006

Pore size control of alumina membrane mask

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Oxides, Nanostructures, Etching, Image processing, Scanning electron microscopy, Photomasks, Aluminum, Wet etching, Oxidation, Nanowires

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PROCEEDINGS ARTICLE | August 20, 2004

Nanofabrication of nanopattern and microdevices using contact/proximity lithography

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Lithography, Light sources, Etching, Glasses, Chromium, Printing, Photomasks, Wet etching, Nanofabrication, Submicron lithography

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PROCEEDINGS ARTICLE | December 27, 1996

Application of direct-write electron-beam lithography for deep-submicron fabrication

Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Wafer-level optics, Oxides, Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Plasma etching, Semiconducting wafers, Plasma

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PROCEEDINGS ARTICLE | December 27, 1996

Conducting poly(aniline-co-N-propanesulfonic acid aniline) (PAPSAH) as charge dissipation layer for e-beam lithography

Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Oxides, Lithography, Electron beam lithography, Electron beams, Optical lithography, Etching, Quartz, Optical alignment, Semiconducting wafers, CMOS devices

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PROCEEDINGS ARTICLE | June 7, 1996

TiSix as a new embedded material for attenuated phase-shift mask

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Thin films, Refractive index, Reflection, Quartz, Argon, Sputter deposition, Ions, Silicon, Transmittance, Phase shifts

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PROCEEDINGS ARTICLE | December 8, 1995

Mix-and-match lithography technology on 6-in. wafers for nanofabrication

Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Lithography, Electron beam lithography, Roads, Control systems, Tantalum, Photoresist processing, Semiconducting wafers, Nanofabrication, Nanolithography, Chemically amplified resists

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PROCEEDINGS ARTICLE | December 8, 1995

Powerful inspection and metrology tool for micro- and nanofabrication

Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Electron beam lithography, Metrology, Gallium arsenide, Inspection, Chromium, Atomic force microscopy, Quantum dots, Scanning electron microscopy, Photomasks, Nanofabrication

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PROCEEDINGS ARTICLE | May 26, 1995

Simulation study of a new phase-shifting mask: halftone-rim

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Refractive index, Optical lithography, Lithographic illumination, Quartz, Chromium, Photoresist materials, Transmittance, Photomasks, Halftones, Phase shifts

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PROCEEDINGS ARTICLE | May 13, 1994

Very simple data processing system for deep submicron nanofabrication

Proc. SPIE. 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV

KEYWORDS: Lithography, Inspection, Computing systems, Chromium, Scanning electron microscopy, Data processing, Telecommunications, Photomasks, Semiconducting wafers, Nanofabrication

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PROCEEDINGS ARTICLE | February 15, 1994

Simulation and fabrication of a new phase-shifting mask for 0.35 um contact hole pattern transfer: half-tone rim

Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Phase shifting, Etching, Transmittance, Photomasks, Wet etching, Reactive ion etching, Halftones, Photomask technology, Device simulation, Phase shifts

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Showing 5 of 20 publications

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