Ms. Si-Hyun Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Materials processing, Optical proximity correction, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Refractive index, Optical lithography, Optical properties, Etching, Reflectivity, Chemical reactions, Critical dimension metrology, Line edge roughness, Bottom antireflective coatings

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