Si-Yeul Yoon
at Photronics Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Chromium, Etching, Critical dimension metrology, Photomasks, Dry etching, Backscatter, Thin films, Mask making, Electron beams, Equipment and services

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Particles, Photomasks, Phase shifting, Chemistry, Glasses, Phase shifts, Semiconducting wafers, Chromium, Etching, Liquids

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Quartz, Etching, Plasma, Scanning electron microscopy, Phase shifts, Photomasks, Phase shifting, Dry etching, Surface roughness, Silicon

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Etching, Plasma, Photomasks, Phase shifts, Plasma etching, Gases, Chlorine, Scanning electron microscopy, Anisotropic etching, Surface roughness

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Photomasks, Phase shifts, Lithography, Semiconducting wafers, Phase shifting, Critical dimension metrology, Transmittance, Cadmium, Deep ultraviolet

Showing 5 of 7 publications
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