Dr. Si Li
at Brewer Science
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 9 April 2024 Presentation + Paper
Si Li, Xinlin Lu, Stephen Grannemann, Daniel Sweat, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Vandana Krishnamurthy, Veerle Van Driessche, Douglas Guerrero
Proceedings Volume 12957, 1295715 (2024) https://doi.org/10.1117/12.3010887
KEYWORDS: Polymers, Film thickness, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Coating, Tin, Silicon, Diffusion

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 129571T (2024) https://doi.org/10.1117/12.3010498
KEYWORDS: Polymers, Extreme ultraviolet lithography, Line width roughness, Lithography, Adhesives, Adhesion, Extreme ultraviolet

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980N (2023) https://doi.org/10.1117/12.2658529
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Coating, Coating thickness, Silicon, Photoresist materials, Adhesion, Line width roughness, Resistance, Adhesives

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top