Siddharth Chauhan
at Univ of Texas at Austin
SPIE Involvement:
Publications (5)

SPIE Journal Paper | 12 March 2014
JM3, Vol. 13, Issue 01, 013012, (March 2014)
KEYWORDS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76392K (2010)
KEYWORDS: Systems modeling, Line edge roughness, Polymers, Diffusion, Calibration, Data modeling, Monte Carlo methods, Lithography, Molecular interactions, Stochastic processes

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 763933 (2010)
KEYWORDS: Particles, Polymers, Monte Carlo methods, Photoresist materials, Photoresist developing, Lithography, Molecules, Diffusion, 3D modeling, Line edge roughness

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 727336 (2009)
KEYWORDS: Polymers, Ionization, Monte Carlo methods, Line edge roughness, Polymer thin films, Interfaces, 3D modeling, Calibration, Molecular interactions, Motion models

Proceedings Article | 22 March 2008 Paper
Proceedings Volume 6922, 692209 (2008)
KEYWORDS: Data modeling, Lithography, Numerical analysis, Semiconducting wafers, Metrology, Testing and analysis, Critical dimension metrology, Finite element methods, Process control, Reticles

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