Siddharth Chauhan
at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 12 March 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules

Proceedings Article | 31 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Polymers, Diffusion, Monte Carlo methods, Molecular interactions, Line edge roughness, Stochastic processes, Systems modeling

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polymers, Particles, Molecules, Diffusion, 3D modeling, Photoresist materials, Monte Carlo methods, Line edge roughness, Photoresist developing

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Calibration, Polymers, Interfaces, 3D modeling, Monte Carlo methods, Ionization, Molecular interactions, Line edge roughness, Motion models, Polymer thin films

Proceedings Article | 22 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Numerical analysis, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Testing and analysis

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top