Dr. Siegfried N. Schwarzl
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Image processing, Scanning electron microscopy, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Cadmium, Imaging systems, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reflectors, Multilayers, Cadmium, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

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