The influence of base layer structure of InGaAs/InP and GaAsSb/InP double heterojunction bipolar transistors in terms of rf-performance and rf-noise behaviour was investigated in detail. With the use of a combined small-signal and rf-noise model it is possible to localize the noise-phenomena to specific device regions. With this knowledge, the transistor can be optimised in terms of the layer-structure achieve improved rf-performance.
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