Silvio Esche
Product Manager at bubbles & beyond GmbH
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Microfluidics, Polymers, Water, Particles, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Plasma etching, Photoresist processing, Semiconducting wafers, Fluid dynamics, Mask cleaning, Plasma, Advanced cleaning techniques

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Microfluidics, Metals, Water, Silicon, Chemistry, Photoresist materials, Photoresist processing, Fluid dynamics, Plasma

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Microelectromechanical systems, Semiconductors, Contamination, Water, Particles, Silicon, Chemistry, Photoresist materials, Photoresist processing, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top