Prof. Silvio Teuber Profile

Prof. Silvio Teuber

R&D Engineer at Advanced Mask Technology Ctr

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Author

Publications (13)

Proceedings Article | 20 October 2006 Paper

Limitations of optical reticle inspection for 45-nm node and beyond

S. Teuber, A. Bzdurek, A. Dürr, J. Heumann, C. Holfeld

Proceedings Volume 6349, 63490T (2006) https://doi.org/10.1117/12.686078

KEYWORDS: Inspection, Photomasks, Image transmission, Reticles, Printing, Optical inspection, Defect detection, Optical lithography, Semiconducting wafers, Defect inspection

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Proceedings Article | 23 March 2006 Paper

Influence of mask manufacturing process on printing behavior of angled line structures

Silvio Teuber, Arndt Dürr, Holger Herguth, Gerhard Kunkel, Timo Wandel, Thomas Zell

Proceedings Volume 6154, 61544C (2006) https://doi.org/10.1117/12.657070

KEYWORDS: Photomasks, Line edge roughness, Line width roughness, Printing, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Manufacturing, Electron beams, Inspection

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Proceedings Article | 15 March 2006 Paper

Mask defect printing mechanisms for future lithography generations

Andreas Erdmann, Thomas Graf, Karsten Bubke, Ingo Höllein, Silvio Teuber

Proceedings Volume 6154, 61541C (2006) https://doi.org/10.1117/12.655558

KEYWORDS: Photomasks, Printing, Lithography, Glasses, Extreme ultraviolet, Phase shifts, Polarization, Semiconducting wafers, Computer simulations, Near field

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Proceedings Article | 15 March 2006 Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proceedings Volume 6154, 61541F (2006) https://doi.org/10.1117/12.656373

KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

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Proceedings Article | 20 October 2005 Paper

VUV spectrophotometry for photomasks characterization at 193 nm

Minghong Yang, Jork Leiterer, Alexandre Gatto, Norbert Kaiser, Ingo Höllein, Silvio Teuber, Karsten Bubke

Proceedings Volume 5965, 59651L (2005) https://doi.org/10.1117/12.625144

KEYWORDS: Photomasks, Polarization, Vacuum ultraviolet, Spectrophotometry, Lithography, Light sources, Transmittance, Computing systems, Diffraction, Resolution enhancement technologies

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Proceedings Article | 28 June 2005 Paper

Determination of mask induced polarization effects on AltPSM mask structures

Ingo Hollein, Silvio Teuber, Karsten Bubke

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617432

KEYWORDS: Photomasks, Polarization, Diffraction, Diffraction gratings, Etching, Lithography, Quartz, Reactive ion etching, Semiconducting wafers, Binary data

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Proceedings Article | 28 June 2005 Paper

Patterning of Ta/SiO2 high transmission EAPSM material for 193nm technology

Corinna Koepernik, H. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, S. Teuber

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617110

KEYWORDS: Etching, Tantalum, Chromium, Reactive ion etching, Optical lithography, Phase shifts, Dry etching, Diffractive optical elements, Oxygen, Photomasks

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Proceedings Article | 28 June 2005 Paper

Study of stress birefringence for 193-nm immersion photomasks

Eric Cotte, Michael Selle, Karsten Bubke, Silvio Teuber

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617034

KEYWORDS: Birefringence, Photomasks, Reticles, Pellicles, Jones calculus, Data modeling, Jones matrices, Distortion, Wave plates, Lead

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Proceedings Article | 12 May 2005 Paper

Determination of mask-induced polarization effects occurring in hyper NA immersion lithography

Silvio Teuber, Karsten Bubke, Ingo Hollein, Ralf Ziebold, Jan Peters

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598641

KEYWORDS: Polarization, Photomasks, Diffraction, Diffraction gratings, Binary data, Semiconducting wafers, Phase shifts, Immersion lithography, Manufacturing, Reflection

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Proceedings Article | 12 May 2005 Paper

Investigation of polarization effects on new mask materials

Karsten Bubke, Silvio Teuber, Ingo Hoellein, Hans Becker, Holger Seitz, Ute Buttgereit

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599688

KEYWORDS: Photomasks, Polarization, Diffraction, Phase shifts, Tantalum, Binary data, Etching, Lithography, Reticles, Absorbance

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Proceedings Article | 6 December 2004 Paper

Pellicle choice for 193-nm immersion lithography photomasks

Eric Cotte, Ruediger Haessler, Benno Utess, Gunter Antesberger, Frank Kromer, Silvio Teuber

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569280

KEYWORDS: Pellicles, Reticles, Photomasks, Image registration, Adhesives, Immersion lithography, Printing, Numerical simulations, Polymers, Performance modeling

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Proceedings Article | 20 August 2004 Paper

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Silvio Teuber Semmler

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

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Proceedings Article | 28 May 2004 Paper

First results from AIMS beta tool for 157-nm lithography

Silvio Teuber, Iwao Higashikawa, Jan-Peter Urbach, Christof Schilz, Roderick Koehle, Axel Zibold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536670

KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Optical resolution, Lithography, Etching, Binary data, Wafer-level optics, CCD image sensors, Optical simulations

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Showing 5 of 13 publications

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