Prof. Silvio Teuber
R&D Engineer at Advanced Mask Technology Ctr
SPIE Involvement:
Publications (13)

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490T (2006)
KEYWORDS: Inspection, Photomasks, Image transmission, Reticles, Printing, Optical inspection, Defect detection, Optical lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 23 March 2006 Paper
Silvio Teuber, Arndt Dürr, Holger Herguth, Gerhard Kunkel, Timo Wandel, Thomas Zell
Proceedings Volume 6154, 61544C (2006)
KEYWORDS: Photomasks, Line edge roughness, Line width roughness, Printing, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Manufacturing, Electron beams, Inspection

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541C (2006)
KEYWORDS: Photomasks, Printing, Lithography, Glasses, Extreme ultraviolet, Phase shifts, Polarization, Semiconducting wafers, Computer simulations, Near field

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541F (2006)
KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

Proceedings Article | 20 October 2005 Paper
Proceedings Volume 5965, 59651L (2005)
KEYWORDS: Photomasks, Polarization, Vacuum ultraviolet, Spectrophotometry, Lithography, Light sources, Transmittance, Computing systems, Diffraction, Resolution enhancement technologies

Showing 5 of 13 publications
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