Prof. Silvio Teuber
R&D Engineer at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Optical inspection, Printing, Image transmission, Photomasks, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Electron beams, Manufacturing, Inspection, Scanning electron microscopy, Printing, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Glasses, Computer simulations, Printing, Near field, Photomasks, Extreme ultraviolet, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | October 20, 2005
Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II
KEYWORDS: Lithography, Diffraction, Light sources, Polarization, Computing systems, Transmittance, Photomasks, Vacuum ultraviolet, Spectrophotometry, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Jones matrices, Data modeling, Birefringence, Wave plates, Distortion, Pellicles, Photomasks, Jones calculus, Lead

Showing 5 of 13 publications
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