Dr. Simi A. George
Scientist at SCHOTT North America Inc
SPIE Involvement:
Scholarship Committee | Author
Publications (26)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9726, Solid State Lasers XXV: Technology and Devices
KEYWORDS: Medicine, Glasses, Ions, Manufacturing, Chromium, Semiconductor lasers, Solids, Ytterbium, Laser spectroscopy, Erbium, Optical pumping, Laser glasses, Lanthanides, Erbium lasers, Absorption

PROCEEDINGS ARTICLE | May 20, 2015
Proc. SPIE. 9466, Laser Technology for Defense and Security XI
KEYWORDS: Refractive index, Glasses, Luminescence, Ions, Manufacturing, Ytterbium, Erbium, Laser glasses, Temperature metrology, Absorption

PROCEEDINGS ARTICLE | February 28, 2014
Proc. SPIE. 8959, Solid State Lasers XXIII: Technology and Devices
KEYWORDS: Sensors, Calibration, Glasses, Luminescence, Crystals, Ions, Monochromators, Neodymium, Laser glasses, Absorption

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Reflectivity, Surface roughness, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Mask cleaning

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reflectivity, Surface roughness, Electroluminescence, Atomic force microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Light sources, Photons, Imaging spectroscopy, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Line edge roughness, Stochastic processes, Chemically amplified resists

Showing 5 of 26 publications
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