Simon Hsieh
at Cymer Southeast Asia Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 18 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Control systems, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Logic, Optical lithography, Modulation, Metals, Scanners, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Metals, Scanners, Control systems, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 12 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Calibration, Scanners, Optimization (mathematics), Semiconducting wafers, Yield improvement, Model-based design, Process modeling

Showing 5 of 6 publications
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