Mr. Simon J. Klaver
Solutions Architect at NP Komplete Technologies BV
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Silicon, Manufacturing, Laser induced breakdown spectroscopy, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Tolerancing, Yield improvement, Standards development

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Visualization, Ions, Diffusion, Manufacturing, Design for manufacturing, Optimization (mathematics), Electronic design automation, Model-based design, Design for manufacturability

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Calibration, Silicon, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Lithography, Sensors, Metals, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Design for manufacturability

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