Dr. Sinjeung Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Vestigial sideband modulation, Diamond patterning

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Data modeling, Modulation, Scattering, Laser scattering, Data processing, Photomasks, Logic devices, Optical proximity correction, Data corrections

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Microscopes, Light sources, Optical lithography, Metals, Near field, Solids, Objectives, Aluminum, Near field optics

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Fringe analysis, Surface plasmons, Finite-difference time-domain method, Polymethylmethacrylate, Metals, Photoresist materials, Photomasks, Aluminum, Light wave propagation

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