Sohan S. Mehta
Principal Member of Technical Staff ( PMTS) at GLOBALFOUNDRIES Inc.
SPIE Involvement:
Area of Expertise:
Lithography process design interaction , EUV , Multiple patterning ( LELE,LELELE, SADP) , Defectivity analysis and improvement , Thick film PSPI process , Immersion lithography and NTD
Profile Summary

Sohan Mehta is currently PMTS in the advanced lithography group at the GLOBALFOUNDRIES Inc. Malta, NY, USA. He earned his MS degree in Applied Optics from the Indian Institute of Technology(IIT) Delhi, India in 1997.He has published over 40 papers ( lithography field) in prestigious conferences and journals including invited papers.Sohan has filed 8 US patents and 2 trade secrets in advanced lithography. He is serving as a reviewer for several journals in lithography area. Sohan has been working in lithography process development for 20 years which includes experience with Micron DRAM Singapore,IME (research institute) Singapore, IBM East Fishkill and Globalfoundries Malta,NY.
His current focus is NTD process development, process- design interaction, multiple patterning, defectivity improvements and thick film PSPI process.
Publications (21)

Proceedings Article | 13 March 2018 Presentation + Paper
Sohan Singh Mehta, Marco Yeung, Fahad Mirza, Thiagarajan Raman, Travis Longenbach, Justin Morgan, Mark Duggan, Rio Soedibyo, Sean Reidy, Mohamed Rabie, Jae Kyu Cho, C. Premachandran, Danish Faruqui
Proceedings Volume 10586, 1058612 (2018)
KEYWORDS: Back end of line, Packaging, Copper, Silicon, Modulation, Semiconducting wafers, 3D modeling, Finite element methods, Reliability, Metals

Proceedings Article | 28 March 2017 Presentation + Paper
Devender Devender, Xumin Shen, Mark Duggan, Sunil Singh, Jonathan Rullan, Jae Choo, Sohan Mehta, Teck Jung Tang, Sean Reidy, Jonathan Holt, Hyung Woo Kim, Robert Fox, D. K. Sohn
Proceedings Volume 10145, 101450K (2017)
KEYWORDS: Overlay metrology, Back end of line, Process control, Lithography, Semiconductors, Semiconductor manufacturing, Resistance, Reliability, Photomasks, Image processing, Metals, Optical lithography

Proceedings Article | 20 March 2015 Paper
Sohan Mehta, Lakshmi Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho
Proceedings Volume 9425, 94250B (2015)
KEYWORDS: Critical dimension metrology, Binary data, Double patterning technology, Etching, Photomasks, Photoresist processing, Nanoimprint lithography, Image processing, Optical lithography, Neodymium

Proceedings Article | 18 March 2015 Paper
Thomas Pistor, Chenchen Wang, Yan Wang, Lei Yuan, Jongwook Kye, Yixu Wu, Sohan Mehta, Paul Ackmann
Proceedings Volume 9426, 94260T (2015)
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Electrons, Signal attenuation, Atomic force microscopy, Photoresist materials, Photomasks, Distortion, Atrial fibrillation, Panoramic photography

Proceedings Article | 17 April 2014 Paper
Craig Higgins, Erik Verduijn, Xiang Hu, Liang Wang, Mandeep Singh, Jerome Wandell, Sohan Mehta, Jean Raymond Fakhoury, Mark Zaleski, Yi Zou, Hui Peng Koh, Pawitter Mangat
Proceedings Volume 9048, 90481Q (2014)
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Metals, Optical lithography, Optical proximity correction, Overlay metrology, Deep ultraviolet, Inspection

Showing 5 of 21 publications
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