Sohan S. Mehta
Principal Member of Technical Staff ( PMTS) at GLOBALFOUNDRIES Inc.
SPIE Involvement:
Author
Area of Expertise:
Lithography process design interaction , EUV , Multiple patterning ( LELE,LELELE, SADP) , Defectivity analysis and improvement , Thick film PSPI process , Immersion lithography and NTD
Profile Summary

Sohan Mehta is currently PMTS in the advanced lithography group at the GLOBALFOUNDRIES Inc. Malta, NY, USA. He earned his MS degree in Applied Optics from the Indian Institute of Technology(IIT) Delhi, India in 1997.He has published over 40 papers ( lithography field) in prestigious conferences and journals including invited papers.Sohan has filed 8 US patents and 2 trade secrets in advanced lithography. He is serving as a reviewer for several journals in lithography area. Sohan has been working in lithography process development for 20 years which includes experience with Micron DRAM Singapore,IME (research institute) Singapore, IBM East Fishkill and Globalfoundries Malta,NY.
His current focus is NTD process development, process- design interaction, multiple patterning, defectivity improvements and thick film PSPI process.
Publications (21)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Packaging, Modulation, Metals, Copper, Silicon, Reliability, 3D modeling, Finite element methods, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Image processing, Reliability, Resistance, Process control, Photomasks, Semiconductor manufacturing, Overlay metrology, Back end of line

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Atrial fibrillation, Signal attenuation, Electrons, Distortion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Photomasks, Panoramic photography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Computational modeling, Calibration, Wavefronts, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 21 publications
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