Dr. Soichi Owa
Nikon Fellow at Nikon Corp
SPIE Involvement:
Fellow status | Conference Chair | Conference Co-Chair | Conference Program Committee | Editor | Author
Publications (32)

SPIE Conference Volume | 23 May 2018

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Metamaterials, Lithography, Optical lithography, Scanners, Particles, Spatial light modulators, Photomasks, Semiconductor manufacturing, Immersion lithography, Maskless lithography, High volume manufacturing, Split ring resonators, Optical metamaterials

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Logic, Optical lithography, Etching, Metals, Transistors, Immersion lithography, Line edge roughness, Reactive ion etching, Photoresist processing

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Polymers, Particles, Inspection, Scanning electron microscopy, Printing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Lithographic illumination, Modulation, Zernike polynomials, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Modulation, Image processing, Error analysis, Distortion, Scanning electron microscopy, Optical simulations, Source mask optimization, Tolerancing, Fiber optic illuminators

Showing 5 of 32 publications
Conference Committee Involvement (12)
Optical Microlithography XXXIII
23 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Showing 5 of 12 published special sections
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