Projection lithography using a liquid crystal display panel in place of a reticle is expected as a low-cost reticleless
patterning method. Here, a simple but useful new exposure system using a projector with highly minute liquid crystal
display panels is proposed. A projector with a light source and red, green and blue liquid crystal display panels was used
as it was, and a set of two commercial macro-lenses was attached as reduction projection optics. The exposure system
was evaluated by printing various patterns. Positive OFPR-800 (Tokyo Ohka Kogyo) was used as a resist. The diameter
of the exposure field was approximately 6 mm. As a result, line patterns with a minimum width of 14 μm were clearly
resolved. However, noticeable partial exposure unevenness was observed for patterns with a width of 40 μm or less.
Because applications using large patterns with widths of 100-200 μm are aimed at hand, it is not a problem, and patterns
with such large sizes are sharply and homogeneously printed even if they are considerably complicated.