Dr. Sonam D. Sherpa
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Ions, Silicon, Hydrogen, Ion beams, Fluorine, Plasma

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Ions, Silicon, Chemistry, Adsorption, Microwave radiation, Plasma generation, Semiconducting wafers, Tellurium, Plasma

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