Song Pang
Senior Manager, Product Marketing at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Reticles, Defect detection, Scanners, Inspection, Image restoration, Printing, Wafer inspection, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Reticles, Finite-difference time-domain method, Manufacturing, Inspection, Printing, Wafer inspection, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Reticles, Defect detection, Inspection, Image resolution, Printing, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Defect detection, Scanners, Inspection, Image restoration, Printing, Wafer inspection, Photomasks, Semiconducting wafers

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