Dr. Sonia Castellanos Ortega
Group Leader at Advanced Research Ctr for Nanolithography
SPIE Involvement:
Conference Program Committee | Author
Publications (5)

SPIE Journal Paper | May 10, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Absorption, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Zirconium, Metals, Lithography, Oxides, Chemical elements

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Scattering, Chemical species, Metals, Crystals, X-rays, Photoresist materials, Zirconium

SPIE Journal Paper | June 22, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Deep ultraviolet, Chemical species, Spectroscopy, Molecules, Electrons, Oxygen, Photoresist materials, Extreme ultraviolet lithography, Chemical reactions, Photoemission spectroscopy, Photochemistry, Hard x-rays, Tin, Oxidation

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Lithography, Light sources, Polymethylmethacrylate, Polymers, Metals, Quantum efficiency, Photoresist materials, Transmittance, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Zirconium, Tin, Absorption, Chemically amplified resists

Conference Committee Involvement (1)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
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