Dr. Soo Han Choi
Principal at Synopsys Inc
SPIE Involvement:
Author
Publications (34)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Stochastic processes

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Electron beam lithography, Metals, Manufacturing, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Logic devices, Algorithm development, 193nm lithography

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Manufacturing, Legal, Printing, Extreme ultraviolet lithography, Immersion lithography, Standards development, 193nm lithography

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photomasks, Extreme ultraviolet, Double patterning technology, Source mask optimization, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Visualization, Legal, Lab on a chip, Photomasks, Acquisition tracking and pointing, Double patterning technology, Electronic design automation

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Optical lithography, Error analysis, Resistance, Monte Carlo methods, Capacitance, Photomasks, Transistors, Critical dimension metrology, Overlay metrology

Showing 5 of 34 publications
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