Soo Kyeong Jeong
Inventor at SK Hynix Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Ions, Chromium, Oxygen, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Molybdenum, Plasma treatment

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Opacity, Printing, Solids, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Contamination, Image processing, Scanners, Ions, Manufacturing, Bridges, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Air contamination, Ultraviolet radiation, Particles, Molecules, Ions, Reflectivity, Chromium, Photomasks, Critical dimension metrology

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