Dr. Soo-ryoung Lee
Manager/CAE at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Data modeling, Calibration, Computer simulations, Image quality, Signal processing, Photomasks, Optical proximity correction, Nanoimprint lithography, System on a chip

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Etching, Metals, Error analysis, Head, Bridges, Photomasks, Logic devices, Optical proximity correction, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Laser metrology

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Molecules, Diffusion, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling, Fiber optic illuminators, Chemically amplified resists

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Roads, Lithographic illumination, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Model-based design, Process modeling

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top