Dr. Soo-ryoung Lee
Manager/CAE at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 5 April 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Data modeling, Calibration, Computer simulations, Image quality, Signal processing, Photomasks, Optical proximity correction, Nanoimprint lithography, System on a chip

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Etching, Metals, Error analysis, Head, Bridges, Photomasks, Logic devices, Optical proximity correction, Model-based design, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Laser metrology

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Molecules, Diffusion, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling, Fiber optic illuminators, Chemically amplified resists

Showing 5 of 15 publications
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