Plasmonic metasurfaces have been receiving tremendous attention because of their extraordinary optical properties. However, time consuming and expensive fabrication methods such as electron beam lithography or focused ion beam (FIB) hinder its commercial application to sensors, color filters, and photovoltaic solar cells. In this study, we demonstrate that metal-dielectric-metal reflective meta-surfaces can be fabricated in a simple and low-cost way using a one-step covalent bonding-assisted nanotransfer process. We prepared various sizes of nanoscale hole-type patterned silicon master, because the represented color depends on the hole size and period. Ag and SiO<sub>2</sub> were deposited onto the replicated polymer stamp from the silicon master, then transferred onto the Al-deposited glass wafer. Strong covalent bonds were formed rapidly between oxygen from the SiO<sub>2</sub> and Si from the adhesive. In this way, we easily fabricated metasurfaces using a one-step nanotransfer process. Finally, finite-difference time-domain method (FDTD) simulation was carried out whose outcome matched experimental results, thus verifying our approach.