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Sophie Klein
Product Manager at KLA Corp
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Author
Publications (2)
Proceedings Article | 2 April 2014 Paper
Mask contribution to intra-field wafer overlay
William Chou, Hsien-Min Chang, Chao Yin Chen, M. Wagner, K.-D. Roeth, S. Czerkas, M. Ferber, M. Daneshpanah, F. Laske, R. Chiang, S. Klein
Proceedings Volume 9050, 90501Q (2014) https://doi.org/10.1117/12.2049000
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Overlay metrology, Metrology, Logic, Data modeling, Lithography, Process control, Ions
Proceedings Article | 31 March 2014 Paper
Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
T. Brunner, V. Menon, C. Wong, N. Felix, M. Pike, O. Gluschenkov, M. Belyansky, P. Vukkadala, S. Veeraraghavan, S. Klein, C. H. Hoo, J. Sinha
Proceedings Volume 9052, 90520U (2014) https://doi.org/10.1117/12.2045715
KEYWORDS: Semiconducting wafers, Overlay metrology, Electronic support measures, Distortion, Optical alignment, Metrology, Photomasks, Lithography, Silicon, Laser range finders
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