Soung Su Cornell Woo
Principal Engineer at ASML
SPIE Involvement:
Publications (4)

Proceedings Article | 28 July 2014 Paper
Alexander Tritchkov, Sergey Kobelkov, Sergei Rodin, Kyohei Sakajiri, Evgueni Egorov, Soung-Su Woo
Proceedings Volume 9256, 92560X (2014)
KEYWORDS: Photomasks, Liquid phase epitaxy, SRAF, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Atrial fibrillation, Source mask optimization, Neodymium

Proceedings Article | 13 March 2012 Paper
Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon
Proceedings Volume 8326, 83260O (2012)
KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 65210Y (2007)
KEYWORDS: Optical proximity correction, Diffusion, Lithography, Resolution enhancement technologies, Manufacturing, Critical dimension metrology, Logic, Design for manufacturability, Photomasks, Electroluminescence

Proceedings Article | 30 July 2002 Paper
Chang-Moon Lim, Jung-Ho Song, Sung-Soo Woo, Ki-Sung Kwon, Chang-Nam Ahn, Ki-Soo Shin
Proceedings Volume 4691, (2002)
KEYWORDS: Stray light, Critical dimension metrology, Photomasks, Scanners, Light scattering, Optical lithography, Lithographic illumination, Semiconducting wafers, Binary data, Chromium

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