In this paper, a maskless single step multiple (two and four) beams surface plasmon interference lithographic
configuration is proposed and illustrated experimentally so as to obtain interference pattern with resolution several orders
less than the illumination source wavelength. This technique utilizes a custom made prism layer configuration to pattern
both one dimensional (grating line) and two dimensional (dot array) periodic nanostructures on the recording medium.
Both aluminum and silver metal films are used for the experimental study. Large area patterns of grating lines and dot
arrays with feature size ≈ 90 nm were experimentally obtained using an exposure radiation of 364 nm wavelength.
A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364 nm.