Srividya Jayaram
Product Manager at Siemens EDA
SPIE Involvement:
Equity, Diversity and Inclusion Committee | Conference Program Committee | Author
Publications (22)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Internet, Reticles, Metrology, Data modeling, Manufacturing, Time metrology, Bridges, Semiconducting wafers, Data integration, Design for manufacturability

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Pattern recognition, Manufacturing, Optical proximity correction, SRAF, Model-based design, Resolution enhancement technologies

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Proceedings Article | 22 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 22 publications
Conference Committee Involvement (3)
DTCO and Computational Patterning
27 February 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
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