Dr. Srividya Revuru
at Univ at Albany
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Molecules, Amplifiers, Oxygen, Photoresist materials, Extreme ultraviolet lithography, Line edge roughness, Thermal modeling, Thermodynamics

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Potassium, Argon, Water, Sulfur, Oxygen, Refraction, Absorbance, Liquids

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top