Staf Verhaegen
Project Engineer ASIC Design at imec
SPIE Involvement:
Publications (26)

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691K (2011)
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Lithography, Critical dimension metrology, Photomasks, Semiconducting wafers

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013008, (January 2011)
KEYWORDS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination

Proceedings Article | 11 March 2010 Paper
Proceedings Volume 7641, 764107 (2010)
KEYWORDS: Logic, Lithography, Optical lithography, Double patterning technology, Electroluminescence, Fiber optic illuminators, Transistors, Photomasks, Source mask optimization, Lithium

Proceedings Article | 4 March 2010 Paper
J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, C. Hennerkes
Proceedings Volume 7640, 764008 (2010)
KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

Proceedings Article | 4 March 2010 Paper
Patrick Wong, Vincent Wiaux, Staf Verhaegen, Nadia Vandenbroeck
Proceedings Volume 7640, 76400I (2010)
KEYWORDS: Double patterning technology, Thin film coatings, Optical lithography, Logic, Semiconducting wafers, Electroluminescence, Image processing, Line width roughness, Printing, Surface plasmons

Showing 5 of 26 publications
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