Mr. Staf Verhaegen
Project Engineer ASIC Design at IMEC
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fin field effect transitor

SPIE Journal Paper | January 1, 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination

PROCEEDINGS ARTICLE | March 11, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Logic, Lithium, Optical lithography, Electroluminescence, Photomasks, Transistors, Double patterning technology, Source mask optimization, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Diffractive optical elements, Scanners, Manufacturing, Electroluminescence, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Surface plasmons, Logic, Optical lithography, Image processing, Electroluminescence, Printing, Line width roughness, Double patterning technology, Thin film coatings, Semiconducting wafers

SPIE Journal Paper | July 1, 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology

Showing 5 of 26 publications
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