Dr. Stefan R. Brandl
at Osram Opto Semiconductors
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Modulation, Water, Scanners, Particles, Interfaces, Coating, Scanning electron microscopy, Head, Photoresist processing, Semiconducting wafers

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Water, Scanners, Inspection, Optical resolution, Immersion lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Scanners, Particles, Head, Photomasks, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Temperature metrology

Proceedings Article | 22 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Semiconductors, Nanotechnology, Lithography, Water, Scanners, Photoresist materials, Immersion lithography, Thin film coatings, Semiconducting wafers, Photoresist developing

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Polymers, Scanners, Coating, Digital watermarking, Platinum, Bridges, Photoresist processing, Semiconducting wafers, Standards development, Defect inspection

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