Mr. Stefan J. Caporale
at Dow Electronic Materials
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 31, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Polymers, Water, Surface roughness, Surface properties, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Refractive index, Optical properties, Reflection, Metals, Water, Interfaces, Refraction, Absorbance, Immersion lithography, Digital micromirror devices

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Transparency, Optical lithography, Imaging systems, Polymers, Spectroscopy, Photoresist materials, Photomasks, Absorbance, Carbon monoxide, Binary data

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Logic, Data modeling, Etching, Polymers, Manufacturing, Photoresist materials, Line edge roughness, Photoresist processing, Prototyping

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Oxides, Lithography, Etching, Dry etching, Polymers, Chemistry, Manufacturing, Resistance, Line edge roughness, Resist chemistry

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Etching, Polymers, Resistance, Photoresist materials, Absorbance, Line edge roughness, Photoresist processing, Resist chemistry

Showing 5 of 6 publications
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