Dr. Stefan Decoster
at imec
SPIE Involvement:
Publications (12)

Proceedings Article | 9 April 2024 Presentation + Paper
D. Montero, N. Buccheri, Q. Lin, S. Roy, S. Paolillo, C. Wu, Y. Hermans, S. Decoster, B. Baudemprez, J. Finoulst, F. Lazzarino, S. Park, Z. Tokei
Proceedings Volume 12958, 129580D (2024) https://doi.org/10.1117/12.3010454
KEYWORDS: Etching, Semiconducting wafers, Dielectrics, Critical dimension metrology, Printing, Lithography, Oxides, Plasma

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12056, 1205605 (2022) https://doi.org/10.1117/12.2610941
KEYWORDS: Etching, Optical lithography, Critical dimension metrology, Inspection, Photomasks, Line edge roughness, Atomic layer deposition, Line width roughness, Extreme ultraviolet

Proceedings Article | 25 May 2022 Presentation + Paper
Stefan Decoster, Souvik Kundu, Frédéric Lazzarino, Stéphane Larivière, Martin O'Toole, Gayle Murdoch, Quoc Toan Le, Marleen van der Veen, Nancy Heylen
Proceedings Volume 12056, 1205604 (2022) https://doi.org/10.1117/12.2614267
KEYWORDS: Metals, Ruthenium, Etching, Double patterning technology, Reactive ion etching

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11611, 116110Q (2021) https://doi.org/10.1117/12.2584807
KEYWORDS: Metrology, Inspection, Ruthenium, Metals, Extreme ultraviolet, Etching, Electron beam lithography, Defect detection

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10959, 109590Q (2019) https://doi.org/10.1117/12.2515989
KEYWORDS: Line width roughness, Metrology, Transmission electron microscopy, Edge detection, Image processing, Semiconducting wafers, Optical lithography, Ion beams, Scanning electron microscopy

Showing 5 of 12 publications
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