Dr. Stefan Decoster
at imec
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Etching, Metals, Inspection, Extreme ultraviolet, Ruthenium

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Edge detection, Metrology, Optical lithography, Image processing, Scanning electron microscopy, Transmission electron microscopy, Ion beams, Line width roughness, Semiconducting wafers

Proceedings Article | 25 March 2019 Presentation + Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Amorphous silicon, Oxides, Optical lithography, Etching, Scanning electron microscopy, Atomic layer deposition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Metals, Dielectrics, Scanning electron microscopy, Photoresist materials, Line edge roughness

Showing 5 of 9 publications
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