Dr. Stefan Hunsche
Technical Director at ASML
SPIE Involvement:
Publications (25)

Proceedings Article | 12 December 2023 Poster + Paper
Nitesh Pandey, Stefan Hunsche, Adam Lyons, Christoph Hennerkes, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Renzo Capelli, Werner Gillijns, Balakumar Baskaran, Joost Bekaert
Proceedings Volume PC12751, PC127510Z (2023) https://doi.org/10.1117/12.2688109
KEYWORDS: Calibration, Metrology, Scanning electron microscopy, Data modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Computational lithography, Design, Optical proximity correction

Proceedings Article | 1 December 2022 Poster + Paper
N. Pandey, S. Hunsche, A. Lyons, J. Chen, R. la Greca, R. Capelli, G. Kersteen
Proceedings Volume 12293, 122930R (2022) https://doi.org/10.1117/12.2641724
KEYWORDS: Photomasks, Calibration, 3D modeling, Data modeling, Metrology, Optical proximity correction, SRAF, Semiconducting wafers, Reticles, Critical dimension metrology

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111Y (2021) https://doi.org/10.1117/12.2584654
KEYWORDS: Overlay metrology, Statistical analysis, Scanning electron microscopy, Metrology, Semiconducting wafers, Error analysis, Critical dimension metrology, Stochastic processes, Shape analysis, Image analysis

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 1160916 (2021) https://doi.org/10.1117/12.2584767
KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

Proceedings Article | 26 March 2019 Presentation + Paper
B. Le-Gratiet, O. Mermet, C. Gardin, S. Desmoulins, T. Kiers, Y. Wang, P. Tang, D. Tien, F. Wang, C. Prentice, W. Tel, S. Hunsche
Proceedings Volume 10959, 109591A (2019) https://doi.org/10.1117/12.2515242
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical lithography, Error analysis, Etching, Scanning electron microscopy, Reliability, Metrology, Control systems, Statistical analysis

Showing 5 of 25 publications
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